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Dispositivo de exfoliación micromecánica en seco

Resumen

Tipo:
Oferta Tecnológica
Referencia:
TOES20140908002
Publicado:
16/09/2015
Caducidad:
15/09/2016
Resumen:
Un grupo de investigación español ha desarrollado un nuevo dispositivo de exfoliación micromecánica en seco de materiales laminares sin producir defectos en el sustrato. Se trata de un método sencillo, versátil y eficiente. Las capas delgadas a nivel atómico obtenidas con este método son de utilidad en las industrias óptica y electrónica. El método permite obtener capas con áreas más grandes y con mayor densidad que las obtenidas con los métodos convencionales. La tecnología ha sido probada en laboratorio. El grupo de investigación, que ha solicitado la patente nacional, busca socios industriales con el fin de establecer acuerdos de licencia o colaboración técnica.

Details

Tittle:
Micromechanical dry exfoliation device
Summary:
A Spanish research group has developed a novel device for dry micromechanical exfoliation of layered materials on any surface without producing defects on the substrate. This approach is very simple, versatile and efficient. The atomically thin layers obtained are useful for optical and electronic industries. A national patent has been applied for but not yet granted. The technology has been tested at laboratory level. Industry partners for licensing or technical collaboration are sought.
Description:
After the discovery of graphene, layered materials have awakened great interest among the scientific community and in industry. Atomically thin layers of these materials present unique mechanical, optical or electronic properties, opening the possibility to develop new applications. The structural features of these materials allow for the deposition of atomically thin layers on a variety of substrates. This may be achieved for instance by the micromechanical exfoliation method, also known as "Scotch tape" method. While this procedure has been widely used for the delamination of graphite, it is limited by the small amount of material obtained and its low quality and reproducibility, which has prevented the escalation of the procedure and its application as an industrial method. There are many alternative methods to the "Scotch tape" one, however most of the dry methods require specific instrumentation and are very difficult to implement in a conventional laboratory.

Spanish Researchers have developed a new device for dry micromechanical exfoliation of two-dimensional materials. The great simplicity together with the relatively high efficiency of the micromechanical exfoliation approach has inspired the development of this device that includes remarkable improvements. The new method enables the exfoliation of layered materials on any surface in a clean and reproducible way. It does not produce defects in the substrate and it makes it possible to obtain larger areas of atomically thin layers and with higher flake density than those obtained by conventional methods. In particular, the new device is especially interesting for the exfoliation of some transition metal dichalcogenides (i.e. TaS2 (Tantalum(IV) sulfide)) which are difficult to delaminate using the traditional "Scotch tape" method.

Atomically thin layers of layered materials have many potential applications, especially in optical and electronic industries. The device is applicable to delamination and production of atomically thin layers of any layered material, highlighting the good results obtained for particular metal dichalcogenides such as TaS2. Other examples of materials that could also be delaminated are graphite, mica, layered materials with intercalation compounds, etc.
Advantages and Innovations:
The main advantages provided by the device are:
- Versatility: the method is applicable to any layered material and on any type of substrate.
- Simplicity: the method consists of a dry exfoliation without adhesive materials.
- Quality and reproducibility: the exfoliation is clean (no trace of adhesive), reproducible and it does not produce defects in the substrate.
- Efficiency: it is possible to deposit a high density of atomically thin layers of the material.
- Control: it is possible to control the pressure exerted, allowing for a fine-tuning of the deposition conditions depending on the nature of the layered material manipulated.
Stage of Development:
Under development/lab tested
IPs:
Patent(s) applied for but not yet granted
CommeR Statunts Regarding IPR Status:
Spanish patent applied for but not yet granted

Partner sought

Type and Role of Partner Sought:
Enterprise in the specific area of layered materials or equipment for production of atomically thin layers of any layered material, for licensing the invention, testing of applications, adaptation to specific needs, production and marketing.

Client

Type and Size of Client:
University
Already Engaged in Trans-National Cooperation:
No
Languages Spoken:
English
Spanish

Keywords

Technology Keywords:
01002007 Nanotechnologies related to electronics & microelectronics