Con esta herramienta te facilitamos un acceso a todas las ofertas y demandas de tecnología europeas y a búsquedas de socios para participar en propuestas europeas de I+D publicadas en la red Enterprise Europe Network, pudiendo filtrar los resultados para facilitar las búsquedas más acordes con tus necesidades.

¿Quieres recibir estos listados de oportunidades de colaboración en tu correo de forma periódica y personalizada? Date de alta en nuestro Boletín

Los términos de búsqueda han de ser en inglés.

Método y dispositivo para medir el coeficiente de reflexión y espesor de capas basado en una modificación de elipsometría

Resumen

Tipo:
Oferta Tecnológica
Referencia:
TODE20160401001
Publicado:
13/06/2016
Caducidad:
13/06/2017
Resumen:
Un equipo de científicos alemanes ha desarrollado un método y dispositivo que permite medir los parámetros característicos de superficies ultrafinas y capas superficiales. La elipsometría es un método de medición óptica de superficies y capas superficiales. Este método mide el coeficiente de reflexión y el espesor de las capas. Los parámetros pueden emplearse para recoger información, como la composición química de materiales. El equipo busca socios industriales con el fin de establecer acuerdos de licencia o cooperación en materia de investigación.


Details

Tittle:
Method and device for measuring refractive index and layer thickness based on a modification of ellipsometry
Summary:
A team of German scientists developed a method and device that allows to measure the characteristic parameters of ultra-thin surfaces and surface layers.
Industrial partners are sought for cooperation on the basis of a licence agreement or a research cooperation agreement.
Description:
Ellipsometry is an established optical measurement method for surfaces and layers close to the surface. This method aims to determine the refractive index along with the layer thickness, which reveals significant characteristic parameters. Those parameters themselves can be used to gather information like the chemical composition of the material.

Known methods use two steps to measure those parameters. First, the ellipsometic angles ¿ and ¿ of the coated surface are measured directly. After this, a computer is used to calculate the refractive index and the layer thickness.
With this method a precisely determining of these parameters is only possible if the coating thickness is large enough. If the measured layers are extremely thin, the influences of the refractive index and the layer thickness on the reflection are not independent from each other. This problem occurs if the layer is thinner than 15nm. Therefore, the determination of the layer thickness in this dimension is only possible if one of both parameters is known before the measurement. In most instances this is not the case.

The offered innovation describes a method for ellipsometry in which the determination of layer thickness is divided into two separate measurements (Measurement A and B) measuring two different pairs of ¿ and ¿. Because the testing body is not moved, the angle of incidence remains constant. Both measurements are only different from each other in terms of the thickness of the measured layer. The layer thickness in measurement A is hereby larger than in B. If not, it is possible that measurement B is done at the not coated part. In both cases the layer thickness may be smaller than 125nm.
There are several ways to archive the described difference in layer thickness between A and B. One example is first measuring a surface without a coating and comparing this to the surface thickness when it is coated.
A mathematical equation deduced along with this invention makes it possible to calculate the refractive index n out of the different ellipsometric angles. It is now possible to determinate the layer thickness with normal ellipsometric methods.

The scientists are looking for partners from industry who are interested in a further development to make this method ready for the market or who are interested in a licence agreement.
Advantages and Innovations:
The advantages and innovations of the offered method and device are:
- Determination of the refractive index with ellipsometry is independend from the layer thickness (even on layer thickness below 15nm)
- Therefore, it is usable also on semiconductors, wave plates or at blooming and anti reflective coatings where the layers and coatings are very thin.
Stage of Development:
Concept stage
IPs:
Patent(s) applied for but not yet granted
CommeR Statunts Regarding IPR Status:
DE patent pending

Partner sought

Type and Role of Partner Sought:
Type of partner sought:
- Industry

Specific area of activity of the partner:
- Measurement technology, Material analysis

Task to be performed:
- common further development (based on research cooperation agreement)
- commercialization of the invention (based on licence agreement)

Client

Type and Size of Client:
University
Already Engaged in Trans-National Cooperation:
Si
Languages Spoken:
English
German

Keywords

Technology Keywords:
09001006 Ensayos de material óptico
02002002 Recubrimientos
09001007 Tecnología óptica relacionada con la realización de medidas
05003002 Óptica