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Microfabricación de trampas atómicas e iónicas multicapa

Resumen

Tipo:
Oferta Tecnológica
Referencia:
TODE20190328005
Publicado:
08/04/2019
Caducidad:
08/04/2020
Resumen:
Un instituto de investigación alemán especializado en metrología ha desarrollado un proceso de microfabricación de trampas atómicas e iónicas multicapa. Los átomos neutros y cargados (iones) se almacenan sobre la superficie de la trampa mediante campos magnéticos o eléctricos que no son homogéneos. Las trampas constituyen una plataforma prometedora para sensores cuánticos y están indicadas para implementar los ordenadores cuánticos del futuro. La trampa desarrollada en el instituto consiste en una serie de capas conductoras gruesas separadas unas de otras por una capa dieléctrica gruesa y conectadas selectivamente entre sí. Las características de alta frecuencia de estas estructuras son excelentes. El instituto ha desarrollado varias técnicas para fabricar estructuras de película delgada planarizadas que cumplen los rigurosos requisitos de las trampas atómicas e iónicas. Se buscan socios con el fin de establecer acuerdos de licencia y cooperación técnica.

Details

Tittle:
Microfabrication of multilayer atom and ion traps
Summary:
A German research institute has developed a process for the microfabrication of multilayer atom and ion traps. Microstructured atom and ion traps are a promising platform for quantum sensors and are well suited to implement future quantum computers. The institute has developed several techniques to manufacture planarized thick film structures that fulfill the stringent requirements set by atom and ion traps. The institute is looking for licensees and technical cooperation agreements.
Description:
A research institute based in Germany and active in metrology has developed a process for the microfabrication of multilayer atom and ion traps. Neutral and charged atoms (ions) can be stored above the trap surface by means of inhomogeneous magnetic or electric fields. One of the essential prerequisites to increase the number of controlled atoms and qubits is a microstructured trap that allows the integration of a large number of signals to be applied (e.g. by integrating microwave conductors). This is achieved by means of stacked structures, like those of a multilayer printed circuit board. The trap developed at the institute consists of a set of thick conductive layers separated from each other by a thick dielectric layer and selectively connected with each other. In principle, the number of metallic-dielectric layers is arbitrary, since each of these layers is flatten by a high-precision global planarization method. The whole process comprises only materials compatible with the stringent requirements of atom and ion traps arising from the ultra-high vacuum environment and from operation at low temperatures. Moreover, the high-frequency characteristics of these structures are excellent. The new proces allows a broad variety of geometries, functionalities and applications for microstructured atom and ion traps.
The institute is looking for licensees and technical cooperation agreements for a joint of further development into individual operating models.
Advantages and Innovations:
Multilayer neutral atom and ion traps based on multilayer structures produced with the offered technology:
- Setup can be scaled for versatile applications
- Trapping of neutral, charged atoms and molecules
- Robust under ultra-high vacuum; temperature range from 4 K up to more than +250 °C
Stage of Development:
Under development/lab tested
IPs:
Patent(s) applied for but not yet granted
CommeR Statunts Regarding IPR Status:
Patent applied in Germany

Partner sought

Type and Role of Partner Sought:
The method can be applied in the fields of microstructured ion and atom traps, quantum data processing and quantum sensor systems. It is suitable to manufacture large numbers of specimens as well as customized samples in cooperation with third parties. The institute looks for licensees and partners for research cooperations, interested in the commercial use of the system as licensee. If necessary the institute offers technical cooperations for a joint of further development of the lab tested system.

Client

Type and Size of Client:
R&D Institution
Already Engaged in Trans-National Cooperation:
Si
Languages Spoken:
English
German

Dissemination

Restrict dissemination to specific countries:
Austria, France, Germany, Italy, Switzerland, United Kingdom

Keywords

Technology Keywords:
01002010 Circuitos impresos y circuitos integrados
01002005 High Frequency Technology, Microwaves
01002011 Informática cuántica
01002001 Micro and Nanotechnology related to Electronics and Microelectronics
02002016 Microingeniería y nanoingeniería