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Modificación de superficies de polvos farmacéuticos mediante deposición por capas atómicas (ALD)

Resumen

Tipo:
Oferta Tecnológica
Referencia:
TOFI20170307001
Publicado:
10/03/2017
Caducidad:
10/03/2018
Resumen:
Una empresa finlandesa ha desarrollado y obtenido la patente de un método para fabricar formas de dosificación de fármacos basadas en capas funcionales y protectoras a escala nanométrica en partículas farmacéuticas. El método basado en deposición por capas atómicas (ALD) permite limitar el uso de excipientes y elimina los numerosos pasos de procesamiento en fabricación farmacéutica, reduciendo así los costes. La tecnología ofrece una forma única de encapsular medicamentos individuales con una conformidad extrema, ofreciendo un método para controlar la solubilidad y disolución de forma ultra precisa. La empresa busca socios de la industria farmacéutica con el fin de establecer acuerdos de investigación, cooperación técnica o licencia.

Details

Tittle:
Modification of pharmaceutical powder surfaces using an Atomic Layer Deposition (ALD) method offered by a Finnish research-based company
Summary:
A Finnish research-based company has developed and patented a method to manufacture drug dosage forms based on nanometre scale functional and protective layers on pharmaceutical particles. The Atomic Layer Deposition (ALD) based method allows to limit the usage of excipients and eliminates numerous processing steps in pharmaceutical manufacturing. The company is now looking for partners in the pharmaceutical sector, for research or technical cooperation agreement, or license agreement.
Description:
Current coating methods used in pharmaceutical industry are complex, energy consuming, expensive, and often result in a poor product stability and yield. A Finnish research-based company has developed and patented a method to manufacture drug dosage forms based on nanometre scale functional and protective layers on pharmaceutical particles. The Atomic Layer Deposition (ALD) based method allows to limit the usage of excipients and eliminates numerous processing steps in pharmaceutical manufacturing consequently lowering the manufacturing costs. The coating method gives an opportunity to extend commercial drug lifecycle and provides great business opportunities and possibility to revolutionize pharmaceutical industry.

At present, industrial polymer coating methods need a thickness of at least 20 µm to ensure complete surface coverage on particles. In pharmaceutical powders, where particle size is ranging from 1 to 200 µm, thus possessing a high specific surface area, this means a great increase in weight and lower drug loading in the end product. Furthermore, conformal coating of small particles with current industrial methods like polymer dispersion spraying is extremely difficult. Pharmaceutical particles are often inhomogeneous and possess irregular shapes, thus their surface chemistry can be highly diverse.

The offered solution is an industrial scale coating technology, where a layer of coating material is applied on the surface of a pharmaceutical substrate using Atomic Layer Deposition (ALD) to produce optimized properties for pharmaceutical particles. By this method coatings are applied to encapsulate or modify API (active pharmaceutical ingredient) drug particles with a thickness ranging from one atomic layer to few nanometres. Technology can solve the problems in pharmaceutical powder processability, improve pharmaceutical characteristics and optimize drug loading efficiency.

The company is currently doing research and collaboration in Europe and in the USA. They are now looking for partners operating in the pharmaceutical industry. The partner can test the Atomic Layer Deposition (ALD) coating method using pilot scale production line that is under construction. Depending on the partner´s interest, the cooperation can be in the form of research or technical cooperation agreement, or license agreement.
Advantages and Innovations:
The two most important advantages of Atomic Layer Deposition (ALD) regardless of particle size or shape are excellent conformality and film thickness control in sub-nanometre level. Atomic Layer Deposition (ALD) is a surface controlled, self-limiting layer-by-layer method for depositing thin films from gaseous phase of precursors. Coating on triboelectric particles significantly significantly improves the powder flow properties, and allows direct tablet compression with high drug loading capacity. This will mean reduction in manufacturing costs, since unit operations of wet granulation and drying can be left out, and less chemicals (binders and excipients) and energy are required. Coating can also protect and stabilize moisture sensitive small molecule or biological drugs prior to drug formulation. Atomic Layer Deposition (ALD) technology provides a unique way to encapsulate individual drug particles with extreme conformity, providing a method to control solubility and dissolution with ultra-precise manner.
Stage of Development:
Already on the market
IPs:
Patents granted

Partner sought

Type and Role of Partner Sought:
The company is looking for partners operating in the pharmaceutical industry. The partner can be a company that is looking for alternative technologies to improve the processability of pharmaceutical powders to make better formulations and drug products. The partner can test the Atomic Layer Deposition (ALD) coating method using pilot scale production line that is under construction.

Depending on the partner and their interest, the cooperation can be in the form of research or technical cooperation agreement, or license agreement.

Client

Type and Size of Client:
Industry SME <= 10
Already Engaged in Trans-National Cooperation:
Si
Languages Spoken:
English
Finnish

Keywords

Technology Keywords:
06004 Micro y nanotecnología relacionada con las ciencias biológicas
02002002 Recubrimientos
06001013 Tecnología médica / ingeniería biomédica