Con esta herramienta te facilitamos un acceso a todas las ofertas y demandas de tecnología europeas y a búsquedas de socios para participar en propuestas europeas de I+D publicadas en la red Enterprise Europe Network, pudiendo filtrar los resultados para facilitar las búsquedas más acordes con tus necesidades.

¿Quieres recibir estos listados de oportunidades de colaboración en tu correo de forma periódica y personalizada? Date de alta en nuestro Boletín

Para optimizar los resultados de la búsqueda, se recomienda utilizar términos en inglés.

Nuevo proceso de deposición a baja temperatura

Resumen

Tipo:
Oferta Tecnológica
Referencia:
TOUK20131025005
Publicado:
02/01/2015
Caducidad:
06/03/2015
Resumen:
Una universidad británica ha llevado a cabo una serie de mejoras en la tecnología de generación de plasma para aumentar la capacidad de los procesos de grabado/deposición de vapor asistidos por plasma a presión atmosférica. Este desarrollo ofrece ventajas en comparación con los métodos actuales: eliminación de técnicas basadas en química húmeda y capacidad para tratar sustratos sensibles. La universidad busca socios con el fin de establecer acuerdos comerciales con asistencia técnica y licencia exclusiva.

Details

Tittle:
New Low Temperature Deposition Process
Summary:
A North West UK University has developed improvements in plasma generation technology to extend the capability of plasma-enhanced chemical vapour deposition/etching processes at atmospheric pressure. This development has advantages over current methods chief of which are removal of wet chemistry based techniques and the ability to treat sensitive substrates. The developer now offers a commercial partnership with technical assistance and the possibility of an exclusive licence to take to market.
Description:
Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semi- conductor industry to produce thin films and micro fabrications. The most common types currently employed are:
Atmospheric pressure CVD (APCVD) - CVD at atmospheric pressure.
Low-pressure CVD (LPCVD) - CVD at sub-atmospheric pressures. Reduced pressures tend to reduce unwanted gas-phase reactions and improve film uniformity across the wafer.
Ultrahigh vacuum CVD (UHVCVD) - CVD at very low pressure.
Currently the majority of manufacture is undertaken using the LPCVD or the UHCVD, giving better quality control and deposition than APCVD but are much more expensive in terms of costs, equipment and use of resources. Researchers at a North West UK University have made advances in plasma generation to extend the capability of plasma-enhanced chemical vapour deposition (CVD) and etching processes at atmospheric pressure. These advances enable the APCVD method to compete on quality and complexity with the other methods whilst operating at greatly reduced costs, even eliminating the need for wet processes. A prototype has been built and now a partner is sought to further develop this technology to production stage and bring to market.
Advantages and Innovations:
Innovations are:
Controllable, highly-activated plasma enables 3D nano-structuring of surfaces
Control of etch and/or deposition rate
Manipulation of surface structure, crystallinity, composition etc.
Enables processing of substrates at substantially reduced temperatures.

With advantages over current APCVD:
Enables the treatment of thermally sensitive substrates e.g. plastics, composites
Removal of wet chemistry-based techniques in manufacture
Online, controllable processing for one or both sides of substrate
Potential for the deposition of novel materials
Highly scalable, low capital cost infrastructure for process technology



Stage of Development:
Prototype available for demonstration
IPs:
Secret Know-how

Partner sought

Type and Role of Partner Sought:
The ideal partner would be involved in the design and manufacture of CVD equipment whose role would be to bring the current prototype to a production standard and bring to market.

Client

Type and Size of Client:
University
Already Engaged in Trans-National Cooperation:
No
Languages Spoken:
English

Keywords

Technology Keywords:
02002016 Microingeniería y nanoingeniería
02002017 Micromecanizado, nanomecanizado
02002019 Microposicionamiento, nanoposicionamiento