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Tecnologías de tratamiento térmico aplicadas a transistores de película delgada (TFT) de óxido y silicio policristalino de baja temperatura (LTPS)

Resumen

Tipo:
Oferta Tecnológica
Referencia:
TOKR20150930001
Publicado:
05/10/2015
Caducidad:
04/10/2016
Resumen:
Una empresa coreana ha desarrollado tecnologías de tratamiento térmico para formar una capa semiconductora de óxido de tipo líquido. El proceso permite el tratamiento a temperatura más baja y con un mayor rendimiento que los equipos de tratamiento térmico actuales. Se trata de una tecnología más económica que los equipos semiconductores actuales. Se buscan socios europeos con el fin de establecer acuerdos comerciales con asistencia técnica.

Details

Tittle:
Heat treatment technologies applied to Low-Temperature Polycrystaline Silicon(LTPS) and Oxide Thin Film Transistor (TFT)
Summary:
A Korean mid-sized company has developed heat treatment technologies to form a liquid type oxide semiconductor layer on a flexible substrate. The process can be treated at a lower temperature with high performance compared to existing heat-treatment equipment. It is looking for a European partner available for a commercial agreement with technical assistance.
Description:
Current goal in the field of display development is to make the display thinner, lighter and have high resolution. On top of that, by converging it with other technologies, displays will have multi-functions and high performance.

To achieve this goal, developing flexible Organic Light Emitting Diode (OLED) display using oxide semiconductor became a key technology to field experts.
The advantages of using oxide semiconductor are as follow.
- compared to amorphous silicon, it has 10 times higher electron mobility
- compared to basic silicon device, it has higher optical transparency
- solution process is possible because it has relatively lower reactivity to moisture and oxygen.

However, applying this oxide to flexible display is not easy work. It is because oxide semiconductor needs to be processed in a multiple vacuum and non-vacuum chamber apparatus. The apparatus for vacuum chamber is expensive in price. And liquid type oxide semiconductors should go through heat treatment at a high temperature during non-vacuum process.

Therefore, to solve this problem, this Korean mid-sized company has developed the technology which can make non-vacuum process possible using oxide semiconductor with their heat treatment technology. Materials can be varied such as oxide semiconductor, dielectric, silicon and so on. It supplies both in-line and batch type equipment. With its heat treatment technologies, liquid type oxide semiconductor layer can be formed on a flexible substrate.

The company wants to introduce this innovative technology to European countries by having partners who can use the equipment under the assistance of technical consultancy. Finally, the company would like to achieve a commercial agreement with technical assistance.
Advantages and Innovations:
- cheaper than the conventional semiconductor equipment
- heat treatment is available at a low temperature (e.g. plastic, PET(polyethylene terephthalate))
- less limitation on the raw materials
- roll-to-roll process is possible
Stage of Development:
Already on the market
IPs:
Patents granted
CommeR Statunts Regarding IPR Status:
Korean patents and PCT granted

Partner sought

Type and Role of Partner Sought:
- Type of partner sought: Companies
- Specific area of activity of the partner: Semiconductor, sensors, flexible/flat panel display industry,
- Task to be performed: commercial agreement with technical assistance.

Client

Type and Size of Client:
Industry SME 50-249
Already Engaged in Trans-National Cooperation:
No
Languages Spoken:
English

Keywords

Technology Keywords:
02002006 Endurecimiento, tratamiento térmico
01002012 Semiconductores
06005002 Sensores y productos inalámbricos