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Tecnologías de limpieza de superficies para mejorar revestimientos por deposición de vapor de alto vacío

Resumen

Tipo:
Demanda Tecnológica
Referencia:
TRSG20151014001
Publicado:
26/10/2015
Caducidad:
25/10/2016
Resumen:
Una empresa de Singapur que ofrece equipos y servicios de deposición de vapor para las industrias de automoción, biomedicina y gas y petróleo busca tecnologías para la eliminación eficaz de contaminantes en superficies metálicas que pueden afectar a la capacidad de adhesión de la capa de carbono amorfo aplicada en la superficie mediante el método de deposición de vapor de alto vacío. Esta solución debe garantizar que la superficie metálica no contiene materias extrañas o films para evitar la interferencia de adhesión entre la superficie y el revestimiento de carbono amorfo aplicado mediante deposición de vapor. Se buscan socios con el fin de establecer acuerdos de licencia, joint venture, I+D o cooperación técnica.

Details

Tittle:
Seeking substrate cleaning technologies for improvement of high vacuum vapour deposition coating
Summary:
A Singapore-based client offering high vapour deposition coating services and equipments for the automotive, biomedical and oil and gas industry is seeking technologies in the effective removal of contaminants (both extrinsic and intrinsic) on metallic substrate surface which may affect the adhesiveness of amphorous carbon layer applied onto the surface via high vacuum vapour deposition method. The client is keen on licensing, joint venture, R-Y-D or technical cooperation with partners.
Description:
To enhance the products and services offerings to their customers and in addressing to customers´ requirements, the Singapore-based client is interested to seek partnerships with suitable providers with technologies or expertise to improve the quality and efficiency of high vacuum vapour deposition coating.

As contaminants on metallic substrate surface may affect the adhesiveness of amphorous carbon layer applied onto the surface via high vacuum vapour deposition method, the proposed contaminant removal solution needs to be compatible into existing chemical vapour deposition batch process.

It should fulfill the following requirements:

The proposed solution should ensure that the metallic substrate surface, possibly made of materials described as follows, is free of foreign matter or film so as to eliminate interference of adhesion between the surface and the layer of amorphous carbon coating applied via vapour deposition:

o Tungsten Carbide (WC), mirror surface finish
o High-Speed Steel (HSS) with mirror surface finish
o High-Speed Steel (HSS) with metallic oxide deposits

An automatic cleaning system is preferred.

The client is keen to explore any of the following modes of partnerships to incporporate the the technology in its products and services to its customers.

i) Licensing
- to adopt the technology and incorporate in its product

ii) R-Y-D Collaboration
- co-development with the potential partner

iii) Joint Venture
- Possible set up of a Singapore entity to jointly offer a new product utilising this technology

iv) Technical Cooperation
- other forms of cooperation involving the technical assistance and support of the partner.
Technical Specification or Expertise Sought:
The proposed solution should be capable of handling items with non-flat substrate surfaces such as drill bits, milling tools, computer numerical controlled (CNC) machine tool components, internal combustion engine piston ring with dimensions described as follows:

o Cutting Tools: 10 - 20 mm in diameter, 50 - 100 mm in length
o Internal Combustion Engine Piston Ring: Approximately 80 mm in diameter, 1 mm thickness

The substrate which requires treatment may comprise porous surface with pore size no smaller than 0.5 mm in diameter (up to 15 mm depth). The contaminant present in the porous surface needs to be removed as well.

The proposed solution should be capable of removing contaminants which may comprise the following:

o Organic Debris (may be hydrocarbon)
o Mineral Dust
o Metallic oxide layer
o Polishing Wax and Polishing Slurry

The proposed solution should not any damage or change the surface roughness of the surface.

The proposed solution should not cause any alteration of the mechanical properties (e.g. surface hardness, strength) of the base material.

The proposed solution should include considerations/guidelines on the handling of substrate after processing. This is to ensure minimum contamination of the substrate material.

Partner sought

Type and Role of Partner Sought:
The proposed partner can be a research institution, university, startup, SME or MNE who has already at least a prototype of the sought technology for demonstration if no market ready version is available.

Types of partnerships can be any of the following:
i) Joint Venture
ii) Licensing´
iii) Research cooperation
iv) Technical cooperation

Client

Type and Size of Client:
Industry SME 11-49
Already Engaged in Trans-National Cooperation:
Si
Languages Spoken:
English